High-repetition-rate droplet target for laser-plasma EUV generation

Lars Malmqvist; Lars Rymell; Hans M. Hertz

doi:10.1364/EUL.1996.ES72

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper ES72
•https://doi.org/10.1364/EUL.1996.ES72

High-repetition-rate droplet target for laser-plasma EUV generation

Lars Malmqvist, Lars Rymell, and Hans M. Hertz

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
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L. Malmqvist, L. Rymell, and H. M. Hertz, "High-repetition-rate droplet target for laser-plasma EUV generation," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper ES72.

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Abstract

A spatially stable liquid-droplet target system for uninterrupted, high-repetition rate and practically debris-free laser-plasma EUV generation is described. The system is based on the continuous liquid jet droplet generation method. System requirements for use in EUV lithography system are analyzed.

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