Characterization of mass-limited ice droplet laser plasmas

D. Torres; F. Jin; M. Richardson; C. DePriest

doi:10.1364/EUL.1996.ES75

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper ES75
•https://doi.org/10.1364/EUL.1996.ES75

Characterization of mass-limited ice droplet laser plasmas

D. Torres, F. Jin, M. Richardson, and C. DePriest

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
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D. Torres, F. Jin, M. Richardson, and C. DePriest, "Characterization of mass-limited ice droplet laser plasmas," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper ES75.

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Abstract

The ice droplet laser plasma can meet the strict cost and operation criteria for a demonstration production-line EUV lithography system. We have begun a systematic theoretical and experimental characterization of the source emission, plasma dynamics and the radiation physics, of the mass-limited ice droplet plasma. We discuss our initial findings.

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