Progress in the Development of EUV Imaging Systems

D. A. Tichenor; A. K. Ray-Chaudhuri; G. D. Kubiak; K. B. Nguyen; S. J. Haney; K. W. Berger; R. P. Nissen; Y. E. Perras; P. S. Jin; L. I. Weingarten; P. N. Keifer; R. H. Stulen; R. N. Shagam; W. C. Sweatt; T. G. Smith; O. R. Wood; A. A. MacDowell; J. E. Bjorkholm; T. E. Jewell; F. Zernike; B. L. Fix; H. W. Hauschildt

doi:10.1364/EUL.1996.EWW2

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper EWW2
•https://doi.org/10.1364/EUL.1996.EWW2

Progress in the Development of EUV Imaging Systems

D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, R. N. Shagam, W. C. Sweatt, T. G. Smith, O. R. Wood, A. A. MacDowell, J. E. Bjorkholm, T. E. Jewell, F. Zernike, B. L. Fix, and H. W. Hauschildt

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
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D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, R. N. Shagam, W. C. Sweatt, T. G. Smith, O. R. Wood, A. A. MacDowell, J. E. Bjorkholm, T. E. Jewell, F. Zernike, B. L. Fix, and H. W. Hauschildt, "Progress in the Development of EUV Imaging Systems," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper EWW2.

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Abstract

An extreme ultraviolet (EUV) ring-field camera, comprised of 3 aspheric mirrors, has been fabricated and evaluated using visible light. The wavefront error (WFE) within a 1 mm × 25 mm field of view is 2.5 nm RMS. In a 10x Schwarzschild optic, having a 0.4 mm diameter field of view, an optically measured WFE of 1 nm RMS has been achieved. EUV images recorded in resist using the Schwarzschild camera are shown. The integration of this camera into a laboratory tool for device fabrication experiments is described.

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