Abstract
We report the current status of research to apply the technique of direct aerial image monitoring (AIM) to measure the performance of an Extreme Ultraviolet Lithography (EUVL) test bed. There are several issues which might limit the possibility of performing image monitoring experiments on EUVL systems. These issues include: Source flux, signal to noise ratios, and EUV scanning aperture fabrication.
© 1996 Optical Society of America
PDF ArticleMore Like This
F. Bijkerk
EWW13 Extreme Ultraviolet Lithography (EUL) 1996
Fernando Brizuela, Sergio Carbajo, Anne Sakdinawat, Yong Wang, David Alessi, Dale Martz, Bradley Luther, Kenneth Goldberg, David Attwood, Bruno La Fontaine, Jorge Rocca, and Carmen Menoni
AFA5 Conference on Lasers and Electro-Optics: Applications (CLEO:A&T) 2010
B. La Fontaine, A. A. MacDowell, Z. Tan, G. N. Taylor, D. L. White, D. M. Tennant, and O. R. Wood
TEO.177 Extreme Ultraviolet Lithography (EUL) 1994