Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > EUL > 1996 > R > R28

Surface Imaging Resists: Promises, Practices and Prospects

Maureen Hanratty

Not Accessible

Your library or personal account may give you access

Abstract

Surface imaging technology has the potential of providing enhanced resolution, larger process latitude and extending the capabilities of optical lithography tools. Surface imaging resist (SIR) processing in the form of the DESIRE process has been used at Texas Instruments for some time. Originally developed for g-line exposure tools (436 nm), it is now being used to push the capabilities of a 248 nm DUV stepper. In this paper the advantages of SIR are reviewed, the current practices described, and prospects for the future applications discussed.

© 1996 Optical Society of America

PDF Article
More Like This
Basic Issues Associated With Four Potential EUV Resist Schemes: Trilayer Organometallic Bilayer, or Plasma Deposited-Plasma & Developed Bilayer, and Silylated Resists

David R. Wheeler, Glenn Kubiak, Avijit Ray-Chaudhuri, and Craig Henderson
R33 Extreme Ultraviolet Lithography (EUL) 1996

Resist Alternatives for Sub-0.35-μm Lithography Using Highly Attenuated Radiation

R. R. Kunz, M. A. Hartney, and M. Rothschild
WC1 Soft X-Ray Projection Lithography (SXRAY) 1992

Limitations to Silylated Resist Technology

Gary N. Taylor, Richard S. Hutton, Susan M. Stein, Craig H. Boyce, Bruno LaFontaine, Alastair MacDowell, and David R. Wheeler
RMM.182 Extreme Ultraviolet Lithography (EUL) 1994

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use