Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > EUL > 1996 > R > R44

Reticle blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers

S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, and H. Hedge

Not Accessible

Your library or personal account may give you access

Abstract

We report on the growth of low defect density Mo/Si multilayer (ML) coatings. The coatings were grown in a deposition system specifically designed for EUVL reticle blank fabrication. Complete, 81 layer, high reflectance Mo/Si ML coatings were deposited on 150 mm diameter (100) oriented Si wafer substrates using ion beam sputter deposition (IBSD). Added defects, measured by optical scattering correspond to defect densities of 2x10-2/cm2. This represents a reduction in defect density of Mo/Si ML coatings by a factor of 105.

© 1996 Optical Society of America

PDF Article
More Like This
Ion-Assisted Sputter Deposition of Mo-Si Multilayers

S.P. Vernon, D.G. Stearns, and R.S. Rosen
MD4 Physics of X-Ray Multilayer Structures (PXRAYMS) 1992

Defects in Coatings Deposited by Planar Magnetron Sputtering: Measurements with a Tencor Surfscan 6200

Khanh B. Nguyen, Paul Resnick, Bruce Draper, Paul Mahl, James H. Underwood, Daniel Chen, and Paul Denham
RMM.209 Extreme Ultraviolet Lithography (EUL) 1994

Development of Extreme Ultraviolet Lithography along the European route

F. Bijkerk
EWW13 Extreme Ultraviolet Lithography (EUL) 1996

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use