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Conferences > EUL > 1996 > R > R49

At-wavelength inspection of EUVL mask defects with a 1X Offner ring-field system

K. B. Nguyen, A. MacDowell, K. Fujii, D. M. Tennant, and L. A. Fetter

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Abstract

At-wavelength inspection of EUV masks containing programmed defects was performed with an EUV 1X Offner ring-field system. At-wavelength inspection was sensitive to thin substrate defects. The sensitivity of the detection was limited by the resolution of the imaging system. At-wavelength inspection also revealed defects that are not detectable by other inspection techniques.

© 1996 Optical Society of America

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