Resonant Four-wave Mixing Processes in Xenon

Yun Mui Yiu; Keith Bonin; T. J. McIlrath

doi:10.1364/EUVS.1982.ME12

Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy
Technical Digest Series (Optica Publishing Group, 1982),
paper ME12
•https://doi.org/10.1364/EUVS.1982.ME12

Resonant Four-wave Mixing Processes in Xenon

Yun Mui Yiu, Keith Bonin, and T. J. McIlrath

Laser Techniques for Extreme Ultraviolet Spectroscopy 1982

Boulder, Colorado United States
8–10 March 1982
ISBN:

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Poster Session (ME)

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Y. M. Yiu, K. Bonin, and T. J. McIlrath, "Resonant Four-wave Mixing Processes in Xenon," in Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy, Technical Digest Series (Optica Publishing Group, 1982), paper ME12.

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Abstract

Four-wave mixing processes have been widely used to generate coherent VUV radiation. In this paper we report the use of intermediate resonances in Xe to enhance the VUV output below 130 nm.

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