Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

A compact ultra-intense plasma-based EUV laser with circular polarization capability

Not Accessible

Your library or personal account may give you access

Abstract

We demonstrated an original technique which allowed us to achieve ultrashort pulse duration EUV lasing by increasing the plasma density. As demonstrated using a lower density amplifier, the emission can be made fully circularly polarized.

© 2016 Optical Society of America

PDF Article  |   Presentation Video
More Like This
Toward compact and ultra-intense laser based soft x-ray lasers

S. Sebban, A. Depresseux, E. Oliva, J. Gautier, F. Tissandier, J. Nejdl, M. Kozlova, G. Maynard, J.P. Goddet, A. Tafzi, A. Lifschitz, H. T. Kim, S. Jacquemot, V. Malka, K. Ta Phuoc, C. Thaury, P. Rousseau, G. Iaquaniello, T. Lefrou, A. Flacco, B. Vodungbo, G. Lambert, P. Zeitoun, and A. Rousse
ATh3C.1 CLEO: Applications and Technology (CLEO:A&T) 2017

100-W few-cycle Yb-fiber laser source based on pre-chirp managed amplification employing circular polarization

Yizhou Liu, Wei Liu, Damian N. Schimpf, Tino Eidam, Jens Limpert, Andreas Tünnermann, Franz X. Kärtner, and Guoqing Chang
JTh2A.38 Advanced Solid State Lasers (ASSL) 2016

Achromatic Circular Polarization Generation for Ultra-Intense Lasers

Patrick Rambo, Mark Kimmel, Guy R. Bennett, Jens Schwarz, Marius Schollmeier, and Briggs Atherton
AFB2 Conference on Lasers and Electro-Optics: Applications (CLEO:A&T) 2010

Presentation Video

Presentation video access is available to:

  1. Optica Publishing Group subscribers
  2. Technical meeting attendees
  3. Optica members who wish to use one of their free downloads. Please download the article first. After downloading, please refresh this page.

Contact your librarian or system administrator
or
Log in to access Optica Member Subscription or free downloads


More Like This
Toward compact and ultra-intense laser based soft x-ray lasers

S. Sebban, A. Depresseux, E. Oliva, J. Gautier, F. Tissandier, J. Nejdl, M. Kozlova, G. Maynard, J.P. Goddet, A. Tafzi, A. Lifschitz, H. T. Kim, S. Jacquemot, V. Malka, K. Ta Phuoc, C. Thaury, P. Rousseau, G. Iaquaniello, T. Lefrou, A. Flacco, B. Vodungbo, G. Lambert, P. Zeitoun, and A. Rousse
ATh3C.1 CLEO: Applications and Technology (CLEO:A&T) 2017

100-W few-cycle Yb-fiber laser source based on pre-chirp managed amplification employing circular polarization

Yizhou Liu, Wei Liu, Damian N. Schimpf, Tino Eidam, Jens Limpert, Andreas Tünnermann, Franz X. Kärtner, and Guoqing Chang
JTh2A.38 Advanced Solid State Lasers (ASSL) 2016

Achromatic Circular Polarization Generation for Ultra-Intense Lasers

Patrick Rambo, Mark Kimmel, Guy R. Bennett, Jens Schwarz, Marius Schollmeier, and Briggs Atherton
AFB2 Conference on Lasers and Electro-Optics: Applications (CLEO:A&T) 2010

Recent Advancements in Compact Laser Plasma EUV Sources based on a Gas Puff Target

Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Miroslaw Szczurek, Anna Szczurek, and Przemyslaw Wachulak
HWC12 High Intensity Lasers and High Field Phenomena (HILAS) 2011

High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources

Yezheng Tao, Alex Schafgans, Slava Rokitski, Michael Kats, Jayson Stewart, Jonathan Grava, Palash Das, Lukasz Urbanski, Mike Purvis, Mike Vargas, Spencer Rich, Mathew Abraham, Phil Conklin, Rob Rafac, Rick Sandstrom, Igor Fomenkov, David Brandt, and Daniel Brown
AM2K.4 CLEO: Applications and Technology (CLEO:A&T) 2016

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved