Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Physics of Laser-Produced Plasma Sources of Extreme Ultraviolet Radiation

Not Accessible

Your library or personal account may give you access


Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

© 2018 The Author(s)

PDF Article
More Like This
Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation

L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W. Ubachs, and O.O. Versolato
EF2A.2 Compact EUV & X-ray Light Sources (EUVXRAY) 2020

A Laser Produced Plasma as an Extreme Ultraviolet Continuum Source for absorption Experiments

E. Jannitti, P. Nicolosi, and G. Tondello
TuB1 Laser Techniques for Extreme Ultraviolet Spectroscopy (EUVS) 1982

Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme

Po-Yen Lai, Kao-Sheng Jao, Rong-Tz Wei, Chia-Ying Hsieh, and Shih-Hung Chen
JT5A.6 Compact EUV & X-ray Light Sources (EUVXRAY) 2018

Select as filters

Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.