Multiple Pulses Damage Test on Mo/Si Multilayer Using Table-top Focused EUV Optical System Built at IPOE

Liuyang Pan; Liuyang Pan; Zhe Zhang; Zhe Zhang; Wenbin Li; Wenbin Li; Zhanshan Wang; Zhanshan Wang

doi:10.1364/EUVXRAY.2020.ETh1A.4

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
OSA Technical Digest (Optica Publishing Group, 2020),
paper ETh1A.4
•https://doi.org/10.1364/EUVXRAY.2020.ETh1A.4

Multiple Pulses Damage Test on Mo/Si Multilayer Using Table-top Focused EUV Optical System Built at IPOE

Liuyang Pan, Zhe Zhang, Wenbin Li, and Zhanshan Wang

Compact EUV & X-ray Light Sources 2020

Washington, DC United States
16–20 November 2020
ISBN: 978-1-943580-73-6

From the session
Compact Sources, Metrology, and X-ray Optics (ETh1A)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
L. Pan, Z. Zhang, W. Li, and Z. Wang, "Multiple Pulses Damage Test on Mo/Si Multilayer Using Table-top Focused EUV Optical System Built at IPOE," in OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), L. Assoufid, P. Naulleau, M. Couprie, T. Ishikawa, J. Rocca, C. Haefner, G. Sansone, T. Metzger, F. Quéré, M. Ebrahim-Zadeh, A. Helmy, F. Laurell, and G. Leo, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper ETh1A.4.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Get Video
Citation alert
Save article

Abstract

We report that EUV damage thresholds follow an inverse-power-law as a function of the pulse number in a S-on-1 damage test on a Mo/Si multilayer, which can be explained by the incubation effect.

PDF Article | Presentation Video

More Like This

Modification of Mo/Si Multilayer Coating by Processing with fs Laser Pulses

Sergey Oshemkov, Vladimir Kruglyakov, Yuval Perets, and Frederik Blumrich
CM_P_16 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2017

Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser
MD3 Optical Interference Coatings (OIC) 2010

Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses

G. Vaschenko, M. Grisham, C. S. Menoni, J. J. Rocca, Yu. P. Pershyn, E. N. Zubarev, D. L. Voronov, V. A. Sevryukova, V. V. Kondratenko, A. V. Vinogradov, and I. A. Artioukov
JMD6 Conference on Lasers and Electro-Optics (CLEO:S&I) 2004

Previous Article Next Article

Presentation Video

Presentation video access is available to:

Optica Publishing Group subscribers
Technical meeting attendees
Optica members who wish to use one of their free downloads. Please download the article first. After downloading, please refresh this page.

Contact your librarian or system administrator
or
Log in to access Optica Member Subscription or free downloads