Abstract
A high repetition rate EUV-FEL is one of the promising candidates for the future high power EUV light source more than 1 kW for future lithography. The design work on the FEL light source and the stepwise development procedure have been proposed elsewhere. Last fiscal year, KEK obtained a funding entitled "New laser technology development for processing laser" from NEDO to develop the high average power mid-infrared FEL. This FEL corresponds to the important stepwise development for EUV-FEL, too. At the conference, the present status of the project and the relationship of the technical development between present mid-infrared FEL and EUV-FEL will be presented.
© 2020 The Author(s)
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