Dose Characterization of the 1 kHz Repetition Rate High-Z Metal X-Ray Source Driven by 20 mJ Femtosecond Pulses

Jonas Reklaitis; Vytenis Barkauskas; Artūras Plukis; Vitalij Kovalevskij; Mindaugas Gaspariūnas; Darius Germanas; Jevgenij Garankin; Tomas Stanislauskas; Kestutis Jasiūnas; Vidmantas Remeikis

doi:10.1364/EUVXRAY.2020.JW4A.3

OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
OSA Technical Digest (Optica Publishing Group, 2020),
paper JW4A.3
•https://doi.org/10.1364/EUVXRAY.2020.JW4A.3

Dose Characterization of the 1 kHz Repetition Rate High-Z Metal X-Ray Source Driven by 20 mJ Femtosecond Pulses

Jonas Reklaitis, Vytenis Barkauskas, Artūras Plukis, Vitalij Kovalevskij, Mindaugas Gaspariūnas, Darius Germanas, Jevgenij Garankin, Tomas Stanislauskas, Kestutis Jasiūnas, and Vidmantas Remeikis

Compact EUV & X-ray Light Sources 2020

Washington, DC United States
16–20 November 2020
ISBN: 978-1-943580-73-6

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Joint Postdeadline Paper Session (JW4A)

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J. Reklaitis, V. Barkauskas, A. Plukis, V. Kovalevskij, M. Gaspariūnas, D. Germanas, J. Garankin, T. Stanislauskas, K. Jasiūnas, and V. Remeikis, "Dose Characterization of the 1 kHz Repetition Rate High-Z Metal X-Ray Source Driven by 20 mJ Femtosecond Pulses," in OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), L. Assoufid, P. Naulleau, M. Couprie, T. Ishikawa, J. Rocca, C. Haefner, G. Sansone, T. Metzger, F. Quéré, M. Ebrahim-Zadeh, A. Helmy, F. Laurell, and G. Leo, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper JW4A.3.

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Abstract

The TW-class 850 nm, 10 fs laser was used to generate the hard X-ray in high-Z targets. The dose rate up to 25 µSv/h was measured using the experimental induced dose measurements and modeling.

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