Recent Advances in Modeling Laser-Driven EUV Light Source Plasmas for Nanolithography

John Sheil; John Sheil; John Sheil; John Sheil; John Sheil; Diko J. Hemminga; Diko J. Hemminga; Diko J. Hemminga; Diko J. Hemminga; Diko J. Hemminga; Mikhail M. Basko; Mikhail M. Basko; Mikhail M. Basko; Mikhail M. Basko; Mikhail M. Basko; Wim Ubachs; Wim Ubachs; Wim Ubachs; Wim Ubachs; Wim Ubachs; Ronnie Hoekstra; Ronnie Hoekstra; Ronnie Hoekstra; Ronnie Hoekstra; Ronnie Hoekstra; Amanda J. Neukirch; Amanda J. Neukirch; Amanda J. Neukirch; Amanda J. Neukirch; Amanda J. Neukirch; James Colgan; James Colgan; James Colgan; James Colgan; James Colgan; Oscar O. Versolato; Oscar O. Versolato; Oscar O. Versolato; Oscar O. Versolato; Oscar O. Versolato

doi:10.1364/EUVXRAY.2022.ETh5A.5

Optica High-brightness Sources and Light-driven Interactions Congress 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper ETh5A.5
•https://doi.org/10.1364/EUVXRAY.2022.ETh5A.5

Recent Advances in Modeling Laser-Driven EUV Light Source Plasmas for Nanolithography

John Sheil, Diko J. Hemminga, Mikhail M. Basko, Wim Ubachs, Ronnie Hoekstra, Amanda J. Neukirch, James Colgan, and Oscar O. Versolato

Compact EUV & X-ray Light Sources 2022

Budapest Hungary
21–25 March 2022
ISBN: 978-1-957171-06-7

From the session
Sources-IV: E-beam and Laser-Driven Plasma (ETh5A)

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J. Sheil, D. J. Hemminga, M. M. Basko, W. Ubachs, R. Hoekstra, A. J. Neukirch, J. Colgan, and O. O. Versolato, "Recent Advances in Modeling Laser-Driven EUV Light Source Plasmas for Nanolithography," in Optica High-brightness Sources and Light-driven Interactions Congress 2022, Technical Digest Series (Optica Publishing Group, 2022), paper ETh5A.5.

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Abstract

The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plasma. We will give an overview of our recent work on modeling the radiative and expansion characteristics of these plasmas.

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