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High-Charge Electron Beams Generation Due To Direct Laser Acceleration In Subcritical Plasma

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Abstract

It is demonstrated that injection of electrons can be reached with sufficiently dense but still subcritical micron scale thick plasma layer with subsequent DLA in the channel formed by the forward propagating pulse. In this case, an efficiency of 1 nC / J can be achieved for the TW laser facility with the pulse energy as low as 50 mJ

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