Extreme Uv Generation with Two-Stage Free Electron Laser

I. Boscolo; W.B. Colson; V. Stagno

doi:10.1364/FEG.1983.WA4

Topical Meeting on Free Electron Generation of Extreme Ultraviolet Coherent Radiation
Technical Digest Series (Optica Publishing Group, 1983),
paper WA4
•https://doi.org/10.1364/FEG.1983.WA4

Extreme Uv Generation with Two-Stage Free Electron Laser

I. Boscolo, W.B. Colson, and V. Stagno

Free Electron Generation of Extreme Ultraviolet Coherent Radiation 1983

Upton, Long Island, New York United States
19–22 September 1983
ISBN:

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Theory and Design (WA)

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I. Boscolo, W. B. Colson, and V. Stagno, "Extreme Uv Generation with Two-Stage Free Electron Laser," in Topical Meeting on Free Electron Generation of Extreme Ultraviolet Coherent Radiation, Technical Digest Series (Optica Publishing Group, 1983), paper WA4.

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Abstract

An electron beam travelling through a bending magnet emits radiation in all the components of its Fourier spectrum. The emission on the harmonics depends on the bunching tightening. This emission is enhanced if the beam goes through a wiggler.

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