Speckle-reduced Holography Using Time-Multiplexed Mask Optimization

Eunbi Lee; Youngjin Jo; Yoonchan Jeong; Byoungho Lee

doi:10.1364/3D.2023.JW2A.17

Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP)
Technical Digest Series (Optica Publishing Group, 2023),
paper JW2A.17
•https://doi.org/10.1364/3D.2023.JW2A.17

Speckle-reduced Holography Using Time-Multiplexed Mask Optimization

Eunbi Lee, Youngjin Jo, Yoonchan Jeong, and Byoungho Lee

Flat Optics: Components to Systems 2023

Boston, Massachusetts United States
14–17 August 2023
ISBN: 978-1-957171-28-9

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Joint Poster Session II (JW2A)

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E. Lee, Y. Jo, Y. Jeong, and B. Lee, "Speckle-reduced Holography Using Time-Multiplexed Mask Optimization," in Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP), Technical Digest Series (Optica Publishing Group, 2023), paper JW2A.17.

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Abstract

Speckle is a serious issue that affects the quality of computer-generated holograms. In this study, we propose an optimization algorithm that employs 16 binary masks to address this problem. By applying time-multiplexing masked phase-only SLM patterns to a conventional computer-generated hologram, we could considerably alleviate the speckle issue.

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