Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Design and the fabrication of a multi-level phase hologram using subwavelength-scale hole array structures

Not Accessible

Your library or personal account may give you access

Abstract

The three-level phase hologram with 128×128 pixels of 10-μm square, 500-nm pitch hole array structures is fabricated. The clear diffracted image is generated for the light with a wavelength of 780 nm.

© 2005 Optical Society of America

PDF Article
More Like This
Massively multi-level optical data storage using subwavelength-sized nano-grating structures

Fred Thomas, Hubert Kostal, and Jian Jim Wang
ThD8 International Symposium on Optical Memory and Optical Data Storage (ODS) 2005

Extraordinary terahertz transmission of elliptical subwavelength hole array

Abul K. Azad, Y. Zhao, and W. Zhang
JWB22 Conference on Lasers and Electro-Optics (CLEO:S&I) 2005

Design and fabrication of diffractive optical elements using the sub-wavelength scale pillar array structure

Masakatsu Hakamata and Hiroyuki Tsuda
IFD3 Integrated Photonics Research (IPR) 2004

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved