Abstract
We report the designs and implementations of microellipsometer as well as near-field scanning optical microscope using spatial polarization symmetry. Their applications in semiconductor metrology will be discussed.
© 2006 Optical Society of America
PDF ArticleMore Like This
Frank Wyrowski and Hagen Schimmel
FThP4 Frontiers in Optics (FiO) 2006
Qiwen Zhan
FThJ6 Frontiers in Optics (FiO) 2011
Erez Hasman
FWL1 Frontiers in Optics (FiO) 2005