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Optica Publishing Group
  • Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper JWC3
  • https://doi.org/10.1364/FIO.2007.JWC3

Influence of Process Conditions on the Optical Properties HfO2/SiO2 Thin Films for High Power Laser Coatings

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Abstract

The influence of process conditions on the loss, refractive index, and laser induced damage threshold (LIDT) of HfO2/SiO2 thin films grown by ion beam assisted sputtering is investigated to realize films with losses less than 20 ppm.

© 2007 Optical Society of America

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