Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper JSuA8
  • https://doi.org/10.1364/FIO.2008.JSuA8

Deep sub-wavelength photolithography using metal-dielectric multilayer

Not Accessible

Your library or personal account may give you access


Using a metal-dielectric multilayer and diffraction-limited masks, we numerically demonstrate a fast and cheap photolithography scheme that can fabricate deep sub-wavelength nanometer scale one- and two-dimensional periodic gratings at wavelength 405nm.

© 2008 Optical Society of America

PDF Article
More Like This
Deep Sub-wavelength confinement in Metal-dielectric Multilayers

Guy Bartal, Geoffroy Lerosey, Yongmin Liu, Dentcho A. Genov, and Xiang Zhang
QWA3 Quantum Electronics and Laser Science Conference (QELS) 2008

Nano-scale focusing of surface plasmons in metallic V-grooves

H. S. Choi, D. F. P. Pile, S. H. Nam, G. Bartal, and X. Zhang
MWD4 Plasmonics and Metamaterials (META_PLAS) 2008


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access Optica Member Subscription

Select as filters

Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved