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Optica Publishing Group
  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper JSuA8
  • https://doi.org/10.1364/FIO.2008.JSuA8

Deep sub-wavelength photolithography using metal-dielectric multilayer

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Abstract

Using a metal-dielectric multilayer and diffraction-limited masks, we numerically demonstrate a fast and cheap photolithography scheme that can fabricate deep sub-wavelength nanometer scale one- and two-dimensional periodic gratings at wavelength 405nm.

© 2008 Optical Society of America

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