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Conferences > FiO > 2012 > FTu3A > FTu3A.15

Maskless Nanopatterning Using a Spatial Light Modulator and Absorbance Modulation

Apratim Majumder, Precious Cantu, Farhana Masid, Rossella Castagna, Chiara Bertarelli, and Rajesh Menon

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Abstract

This paper reports the application of absorbance modulation optical lithography (AMOL) in maskless photon-based patterning of non-periodic two-dimensional arbitrary patterns by using a micromechanical-mirror array-based optical system and absorbance modulation.

© 2012 Optical Society of America

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