Simple and Accurate Optical Height Sensor for Wafer Inspection Systems

Kei Shimura; Naoya Nakai; Koichi Taniguchi

doi:10.1364/FIO.2015.FM2G.3

Frontiers in Optics 2015
OSA Technical Digest (online) (Optica Publishing Group, 2015),
paper FM2G.3
•https://doi.org/10.1364/FIO.2015.FM2G.3

Simple and Accurate Optical Height Sensor for Wafer Inspection Systems

Kei Shimura, Naoya Nakai, and Koichi Taniguchi

Frontiers in Optics 2015

San Jose, California United States
18–22 October 2015
ISBN: 978-1-943580-03-3

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Optical Metrology (FM2G)

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K. Shimura, N. Nakai, and K. Taniguchi, "Simple and Accurate Optical Height Sensor for Wafer Inspection Systems," in Frontiers in Optics 2015, OSA Technical Digest (online) (Optica Publishing Group, 2015), paper FM2G.3.

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Abstract

We have developed a height sensor in which eight slits are projected on a surface obliquely and their image is detected by an area sensor. Accuracy of 0.3 um is achieved on patterned wafer.

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