Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Selective growth and coalescence of GaAs on Si (001) substrates using a round-hole nanopatterned SiO2 mask

Not Accessible

Your library or personal account may give you access

Abstract

The epitaxy of GaAs on round-hole nanopatterned GaAs/Si substrates is studied. Faceted growth fronts and the tilt of GaAs pillars are observed. Experimental results show that the deposition selectivity is not sensitive to growth temperature.

© 2015 Optical Society of America

PDF Article
This paper was not presented at the conference

More Like This
Epitaxial lateral overgrowth of GaAs on (001) Si nano-trenches

Yunrui He, Jun Wang, Haiyang Hu, Qi Wang, Yongqing Huang, and Xiaomin Ren
CE_P_18 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2015

Selective area growth of GaAs on silicon

Yunrui He, Jun Wang, Can Deng, Haiyang Hu, Qi Wang, Yongqing Huang, and Xiaomin Ren
ATh2A.1 Asia Communications and Photonics Conference (ACP) 2014

Direct Growth of Thick AlN Template on Micro-circle Patterned-Si Substrate

Binh Tinh Tran, Hideki Hirayama, Noritoshi Maeda, Masafumi Jo, and Shiro Toyoda
26H1_4 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.