Large-Area Lithography-Free Metamaterial Thermophotovoltaic Emitters with Oxygen Tolerance

Zachary J. Coppens; Ivan I. Kravchenko; Jason G. Valentine

doi:10.1364/FIO.2016.JW4A.151

Frontiers in Optics 2016
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper JW4A.151
•https://doi.org/10.1364/FIO.2016.JW4A.151

Large-Area Lithography-Free Metamaterial Thermophotovoltaic Emitters with Oxygen Tolerance

Zachary J. Coppens, Ivan I. Kravchenko, and Jason G. Valentine

Frontiers in Optics 2016

Rochester, New York United States
17–21 October 2016
ISBN: 978-1-943580-19-4

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Joint Poster Session I (JW4A)

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Z. J. Coppens, I. I. Kravchenko, and J. G. Valentine, "Large-Area Lithography-Free Metamaterial Thermophotovoltaic Emitters with Oxygen Tolerance," in Frontiers in Optics 2016, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper JW4A.151.

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Abstract

We present a large-area metamaterial thermal emitter that is fabricated using facile, lithography-free techniques. The device shows stable, selective emission after exposure to 1173 K for 22 hours in oxidizing and inert atmospheres.

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