Abstract
We optimize the oxygen working pressure for pulsed laser deposition of NiO thin films for the fabrication of p-NiO/n-Si photodiode. We show the responsivity ~0.05 for UV illumination and 0.01 A/W in case of visible.
© 2019 The Author(s)
PDF ArticleMore Like This
Savita Chaoudhary, Avijit Dewasi, Vipul Rastogi, and Anirban Mitra
JW3A.27 CLEO: Applications and Technology (CLEO:A&T) 2022
M. Kandyla, C. Chatzimanolis, C. Charitidis, M. Guziewicz, and M. Kompitsas
CM_P_20 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2013
Yacouba Diawara, John F. Currie, and S. Iraj Najafi
MO1 OSA Annual Meeting (FIO) 1990