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Manufacture Protocol for the Control of Epsilon-Near-Zero Properties in Indium Tin Oxide Nanolayer at Telecommunication Wavelength

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We experimentally demonstrate the tuning of the epsilon-near-zero (ENZ) properties in indium tin oxide (ITO) film by direct-current magnetron sputtering, and present a stable method to produce ITO films with ENZ point at telecommunication wavelength.

© 2021 The Author(s)

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