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Conferences > FiO > 2022 > FM5C > FM5C.6

Concurrent inverse design of structured light and metasurface for nanopatterning process

Myungjoon Kim, Nayoung Kim, and Jonghwa Shin

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Abstract

We demonstrate an adjoint-based concurrent optimization method for an incident wavefront and metasurface pair that can outperform the previous metasurfaces used for interference-based nanofabrication processes.

© 2022 The Author(s)

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