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Conferences > Freeform > 2019 > JT5A > JT5A.30

Fabrication of Modified Double Half Wave Band-Pass Filter Using Alternately Stacked TiO2-SiO2 Multilayer

Mukesh Kumar, Neelam Kumari, Amit L. Sharma, Vinod Karar, and R K Sinha

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Abstract

In the present study, a multilayer band pass filter using 11 layers of alternate TiO2 and SiO2 were fabricated on a BK7 substrate using ion assisted electron-beam deposition technique. The filter was designed to have maximum transmission at 545 nm (Green) with adequate bandwidth to allow maximum energy transmission in the green wavelength band. The fabricated filter was found to have a bandwidth of 45 nm with a peak transmission of 91.5% at 545 nm.

© 2019 The Author(s)

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