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Electron-Beam Written Ultra-Micro Fresnel Lens Array with High-Efficiency Structure

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Abstract

In a fabrication of micro optical components, the electron-beam (EB) writing technique has potential for submicron patterning and flexibility for the design. Recent progress in the EB writing technique has shown a feasibility of a blazed relief structure1. In a micro Fresnel lens, the blazed relief structure improves the focusing efficiency. An array of such micro Fresnel lenses can be applied for optical instruments including line scanners, copying machines, CCD image sensors, and interfaces in future optical computer.

© 1987 Optical Society of America

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