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Conferences > HISE > 2016 > JW4A > JW4A.39

Fabrication of nanostructures using plasmonic nanolithography depends on spacing layer

Heesang Ahn, Taeyeon Kim, Hyerin Song, and Kyujung Kim

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Abstract

We investigated plasmonic lithography using nanohole array mask which allows generation of subwavelength exposure by different gap distance. The fabricated pattern through nanohole mask was investigated as gap distance changes.

© 2016 Optical Society of America

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