Abstract

Submicrometer photolithography necessitates high resolution imaging system. Optical holography is one of the promising candidates for realizing such high resolution imaging systems. Several optical system utilizing holograms have been demonstrated until now including far-field holograms, image holograms, and focused image holograms. In order to achieve the required high resolution, there is to decreasing the wavelength or to increasing the numerical aperture. Two fundamental parameters limiting an optical system are the numerical aperture, NA, and the size of the image field of the imaging optics.¹ For a given wavelength, the resolution is improved by increasing the numerical aperture. As a result, the increasing NA lead to decreasing the focal tolerance. In this paper we present the high resolution holographic imaging system using a focused imaging hologram with phase conjugate wave and demonstrated a long focal tolerance of an image.

© 1996 Optical Society of America