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Conferences > ICQI > 2007 > JWC > JWC33

Sub-Rayleigh Lithography using a Multiphoton Absorber

Heedeuk Shin, Malcolm N. O’Sullivan-Hale, Hye Jeong Chang, and Robert W. Boyd

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Abstract

We demonstrate sub-rayleigh lithography for enhancing the resolution of optical interferometric patterns using poly(methyl-methacrylate)(PMMA). We exceed standard Rayleigh resolution limit by a factor of three and calculate the multi-photon absorption cross section of PMMA.

© 2007 Optical Society of America

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