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Conferences > ICQI > 2008 > QTuB > QTuB4

Resonant Interferometric Lithography beyond the Diffraction Limit

Jörg Evers, Martin Kiffner, and M. Suhail Zubairy

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Abstract

We discuss interferometric optical subwavelength lithography using resonant light-matter interactions only. As compared to previous schemes, no multiphoton processes are required, such that the scheme works at low light intensities.

© 2008 Optical Society of America

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