Abstract

Monolithically integrated optical circuits require use of a laser which is fabricated by a technique which is compatible with the planar technology. Typically it has been suggested that this will be a DFB or DBR laser structure. Other monolithic lasers have utilized etch steps fabricated chemically or by ion beam milling, or facets fabricated by crystal growth. Each of these techniques is limited by fabrication difficulties. We suggest here a simple and rapid fabrication method which has given excellent results reproducibly, and may have application in several devices. We demonstrate the usefulness of this technique in a study of integrated optics laser amplifiers and report measurements of gain.

© 1980 Optical Society of America