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Extensions of the Linear Model for Tolerance Computation

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Abstract

In order to estimate the effect of manufacturing errors on image quality we construct a mathematical/statistical model for MTF-based aberrations. This model uses data from an optical design program to predict the changes in aberrations, such as the decreased MTF at best focus, the shift of focus, etc., caused by manufacturing errors such as tilt or decentration of elements and groups. The model can be used to predict the yield, that is, the expected number of manufactured samples for which the quality measures fall within acceptable limits. Starting with tolerances and estimates of the fraction of samples for which the tolerances are satisfied, the model will predict the fraction of samples for which a particular quality measure will fall within given limits.

© 1994 Optical Society of America

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