Abstract

One important approach toward producing 0.1 micrometer lithographic features is EUV lithography. This technology requires ring-field reflective projection cameras to produce well corrected aerial images over a 1 x 26 mm arc field. Since the creation and application of the concept of ring field for lithographic systems little more has been published about the characteristics of such systems and their interesting attributes. The effects of smile vignetting, optical surface description choice, and quasi-ring field symmetry are examples that deserve a broader discussion. The presentation will address these effects and the trends in the optical design of all- reflective projection cameras for EUV lithography.

© 1998 Optical Society of America