Abstract

The first item discussed in this paper is to forecast the future trend regarding NA and the wavelength. The resolution limit is defined as a minimum feature size which retains practical DOF and the analysis is made by simulation. Pattern geometry is classified into two categories, which are dense lines and isolated lines. Available wavelengths are assumed to be KrF excimer laser (λ =248nm), ArF excimer laser (λ =193nm) and F₂ excimer laser (λ =157nm). Based upon the simulation results, resolution limit is estimated for each geometry and each wavelength.

© 1998 Optical Society of America