An Overview of Optical Systems for 30 nm Resolution Lithography at EUV Wavelengths

Russ Hudyma

doi:10.1364/IODC.2002.IMD1

International Optical Design Conference
2002 OSA Technical Digest Series (Optica Publishing Group, 2002),
paper IMD1
•https://doi.org/10.1364/IODC.2002.IMD1

An Overview of Optical Systems for 30 nm Resolution Lithography at EUV Wavelengths

Russ Hudyma

International Optical Design Conference 2002

Tucson, Arizona United States
3–5 June 2002
ISBN: 1-55752-714-8

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Lithography Systems (IMD)

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R. Hudyma, "An Overview of Optical Systems for 30 nm Resolution Lithography at EUV Wavelengths," in International Optical Design Conference, 2002 OSA Technical Digest Series (Optica Publishing Group, 2002), paper IMD1.

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Abstract

Using examples taken from the patent literature, this presentation provides an overview of contemporary all-reflective projection systems designed for EUV lithography at 13.4 nm.

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