Abstract

Most advanced refractive optical designs from Carl Zeiss are the basis of lenses for DUV microlithography, providing a resolution of better than 100nm across the full image field of a state-of-the-art scanner. However, in the design process towards implementing maximum numerical apertures and increasingly short wavelengths, many design and technology advances achieved in many years design experience at Carl Zeiss have been incorporated.

The history of these designs goes back to the year 1902 -exactly 100 years ago - when Moritz von Rohr calculated the first monochromatic UV micro-objectives at Carl Zeiss for ultra-high resolution microphotography conducted by means of a line-narrowed UV light source.

© 2002 Optical Society of America