High NA projection lens designs for exposure tools

Toshiro Ishiyama; Kotaro Yamaguchi

doi:10.1364/IODC.2002.IMD5

International Optical Design Conference
2002 OSA Technical Digest Series (Optica Publishing Group, 2002),
paper IMD5
•https://doi.org/10.1364/IODC.2002.IMD5

High NA projection lens designs for exposure tools

Toshiro Ishiyama and Kotaro Yamaguchi

International Optical Design Conference 2002

Tucson, Arizona United States
3–5 June 2002
ISBN: 1-55752-714-8

From the session
Lithography Systems (IMD)

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T. Ishiyama and K. Yamaguchi, "High NA projection lens designs for exposure tools," in International Optical Design Conference, 2002 OSA Technical Digest Series (Optica Publishing Group, 2002), paper IMD5.

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Abstract

In the history of the semiconductor industry, exposure tools have been improved in resolution, throughput, overlay etc. The improvement of resolution has been dramatically expedited in recent years, based on the silicon technology roadmap (ITRS), where the shrinking rate of the critical dimensions has been 20% to 30% every two years.

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