Monte Carlo Tolerancing Tool using Non-Sequential Ray Tracing on a Compute Cluster

Christopher Reimer

doi:10.1364/IODC.2010.IThA3

International Optical Design Conference and Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper IThA3
•https://doi.org/10.1364/IODC.2010.IThA3

Monte Carlo Tolerancing Tool using Non-Sequential Ray Tracing on a Compute Cluster

Christopher Reimer

International Optical Design Conference 2010

Jackson Hole, Wyoming United States
13–17 June 2010
ISBN: 978-1-55752-893-3

From the session
Design of Illumination Systems: Optimization and Tolerancing Approaches (IThA)

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C. Reimer, "Monte Carlo Tolerancing Tool using Non-Sequential Ray Tracing on a Compute Cluster," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper IThA3.

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Abstract

Monte Carlo tolerancing and non-sequential ray tracing are both known to have a high computational cost. This paper describes an almost interactive tool that combines these techniques on a compute cluster.

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