Fidelity Comparison of Phase Masks for Hybrid Imaging

Tom Vettenburg; Andy Wood; Nicholas Bustin; Andrew R. Harvey

doi:10.1364/IODC.2010.ITuB4

International Optical Design Conference and Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper ITuB4
•https://doi.org/10.1364/IODC.2010.ITuB4

Fidelity Comparison of Phase Masks for Hybrid Imaging

Tom Vettenburg, Andy Wood, Nicholas Bustin, and Andrew R. Harvey

International Optical Design Conference 2010

Jackson Hole, Wyoming United States
13–17 June 2010
ISBN: 978-1-55752-893-3

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Optical Design for Modern Digital Systems and Computational Imaging (ITuB)

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T. Vettenburg, A. Wood, N. Bustin, and A. R. Harvey, "Fidelity Comparison of Phase Masks for Hybrid Imaging," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper ITuB4.

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Abstract

Optical-digital hybrids are able to increase defocus tolerance; however, choosing the optimal pupil phase modulation is non-trivial. We show how hybrid imaging fidelity can be predicted and compare some of the most common phase-functions.

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