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Determination Of Wafer And Process Induced Resonant Frequency Variation In Silicon Microdisk-Resonators

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Abstract

By comparing the frequency deviations of the TE and TM modes of identically designed silicon microdisk-resonators across a wafer, we demonstrate that layer thickness non-uniformity is the dominant cause of fabrication-induced microdisk-resonator frequency deviation.

© 2009 Optical Society of America

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