Abstract

Permanent index changes, Δn, of the order of 10^-4 at 633 nm are induced in germanosilicate optical fibers by exposure to light at 488, 266, and 240 nm.^1-3 This photorefractivity has great potential in the fabrication of efficient grating-based devices for a wide range of WDM and lasing applications. It has been explained² in terms of alterations in the UV absorption spectrum yielding (through the Kramers-Kronig relation) almost dispersion-free Δn values between 500 nm and 1.5 μm. The predominant cause is the movement of electrons from broken oxygen deficient Ge–Si bonds (associated absorption peak at 240 nm) to Ge(2) traps (when occupied by an electron an absorption peak appears at 213 nm) (see Fig. 1). The Ge–Si bonds can be broken by single-photon absorption of 240-or 266-nm light (permitting gratings of any period to be fabricated by side writing), or (much more slowly) by two-photon absorption (TPA) of 488-nm light. However, an undesirable side effect of 266-nm treatment is that the absorption induced for approximately the same Δn value is some two orders of magnitude larger than that obtained with 488-nm light (30 dB/m at 633 nm). This absorption is attributed to the creation of Ge(1) color centers,⁴ with a broad absorption peak centered at 281 nm and extending into the visible (Fig. 1). Because the balance between bleaching and trapping at Ge(1) and Ge(2) dopant sites is different for 266-nm light, it seemed possible that the population of Ge(1) centers could be depleted by 488-nm light, perhaps even enhancing the induced Δn.

© 1990 Optical Society of America