Abstract

We discuss a III-V-based monolithically integrated measurement microsystem for optical displacement sensing. The sensor, consisting of a Michelson interferometer with an integrated DBR laser and waveguide photodetector, has been fabricated on a single GaAs substrate. Alignment requirements are reduced to that of a lens for beam collimation; displacement measurements with sub-1 O0 nm resolution have been performed. The same technology may also be employed for integrated optical refractometric chemical sensors.

© 1996 Optical Society of America