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Conferences > IPR > 2002 > IFE > IFE4

Improved performance of compact silica 2DIO wavelength filters

C.N. Morgan, R.V. Penty, I.H. White, and S. Yu

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Abstract

Following etch process optimisation, passband characteristics of a 3.2nm spacing silica 2DIO demultiplexer for datacommunications applications is shown. Nonadjacent crosstalk is improved from 21,7dB minimum to 23.5dB minimum, with insertion loss variation reduced to 0.9dB.

© 2002 Optical Society of America

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