Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > IPR > 2004 > IThG > IThG4

Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

Y. Barbarin, X.J.M. Leijtens, E.A.J.M. Bente, C.M. Louzao, J.R. Kooiman, and M.K. Smit

Not Accessible

Your library or personal account may give you access

Abstract

A compact low-loss 4×4 AWG demultiplexer with a channel spacing of 400GHz is presented. The device size is reduced to only 230×330µm2. Measured insertion losses are less than 5dB and the crosstalk is below −12dB.

© 2004 Optical Society of America

PDF Article
More Like This
Loss reduction for phased-array demultiplexers using a double etch technique

C. van Dam, A. A. M. Staring, E. J. Jansen, J. J. M. Binsma, T. van Dongen, M. K. Smit, and B. H. Verbeek
IMC6 Integrated Photonics Research (IPR) 1996

Low-loss and flat/wide-passband CWDM demultiplexer using silica-based AWG with multi-mode output waveguides

S. Kamei, Y. Doi, Y. Hida, Y. Inoue, S. Suzuki, and K. Okamoto
TuI2 Optical Fiber Communication Conference (OFC) 2004

Design and fabrication of an InP-based arrayed waveguide grating

Xilin Zhang, Ruikang Zhang, Dan Lu, Baojun Wang, and Chen Ji
AF2B.18 Asia Communications and Photonics Conference (ACP) 2013

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use