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Guided-Mode-Resonance Enabled Absorption in Amorphous Silicon for Thin-Film Solar Cell Applications

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Abstract

Nanoscale patterns with 300-nm periods are fabricated on thin films of amorphous silicon on glass substrates. Around 50% integrated absorption enhancement compared to unpatterned silicon reference samples is observed for the 400–950-nm wavelength range.

© 2011 Optical Society of America

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