CMOS-compatible Vertical Si-waveguide Coupler Fabricated by Ion Implantation

Tomoya Yoshida; Emiko Omoda; Yuki Atsumi; Takashi Nishi; Syougo Tajima; Syougo Tajima; Ryohei Takei; Noboru Miura; Masahiko Mori; Youichi Sakakibara; Youichi Sakakibara

doi:10.1364/IPRSN.2016.ITu2B.1

Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF)
OSA technical Digest (online) (Optica Publishing Group, 2016),
paper ITu2B.1
•https://doi.org/10.1364/IPRSN.2016.ITu2B.1

CMOS-compatible Vertical Si-waveguide Coupler Fabricated by Ion Implantation

Tomoya Yoshida, Emiko Omoda, Yuki Atsumi, Takashi Nishi, Syougo Tajima, Ryohei Takei, Noboru Miura, Masahiko Mori, and Youichi Sakakibara

Integrated Photonics Research, Silicon and Nanophotonics 2016

Vancouver Canada
18–20 July 2016
ISBN: 978-1-943580-14-9

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Silicon Photonics II (ITu2B)

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T. Yoshida, E. Omoda, Y. Atsumi, T. Nishi, S. Tajima, R. Takei, N. Miura, M. Mori, and Y. Sakakibara, "CMOS-compatible Vertical Si-waveguide Coupler Fabricated by Ion Implantation," in Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) (Optica Publishing Group, 2016), paper ITu2B.1.

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Abstract

Few-micron-scale vertical silicon coupler that has weak wavelength dependence and weak incident angle dependence was achieved with vertically curved waveguide “elephant coupler” fabricated by ion implantation method compatible with CMOS technology.

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